Reactive sputtering deposition of perovskite oxide and oxynitride lanthanum titanium films: structural and dielectric characterization - Université de Rennes Accéder directement au contenu
Communication Dans Un Congrès Année : 2013

Reactive sputtering deposition of perovskite oxide and oxynitride lanthanum titanium films: structural and dielectric characterization

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hal-00846798 , version 1 (20-07-2013)

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  • HAL Id : hal-00846798 , version 1

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Yu Lu, Claire Le Paven-Thivet, Viet Hung Nguyen, Ratiba Benzerga, Laurent Le Gendre, et al.. Reactive sputtering deposition of perovskite oxide and oxynitride lanthanum titanium films: structural and dielectric characterization. E-MRS 2013 Spring Meeting "European Material Research Society", May 2013, STRASBOURG, France. ⟨hal-00846798⟩
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