Stress birefringence patterning in photopolymer induced by structured illumination

Jean-Philippe Bombenger (1) , Alberto Barsella (1) , Christiane Carré (2, 3) , Gregory Taupier (1) , Kokou Dorkenoo (1) , Loic Mager (1)

1 Groupe d'Optique Non Linéaire et d'Optoélectronique
2 DPG - Département de Photochimie Générale
3 FOTON - Fonctions Optiques pour les Technologies de l'informatiON

We report on the stress birefringence distribution induced by the photopatterning of a multifunctional crosslinkable acrylate monomer sensitized in the visible range. The patterning of this material, prepared in a glass cell of a few tens of microns thickness, is obtained through illumination in a two steps process. The first step is performed using an illumination pattern with a high contrast and a low spatial frequency. The second one is a uniform illumination. The discrepancies in the shrinkage experimented by the material leads to the apparition of patterned stress birefringence revealed through polarimetry and diffraction measurements.

Mots clés: Polarization; Diffraction; Organic Material; Birefringence

Domaines: Matériaux

Jean-Philippe Bombenger, Alberto Barsella, Christiane Carré, Gregory Taupier, Kokou Dorkenoo, et al.. Stress birefringence patterning in photopolymer induced by structured illumination. Optical Materials, 2013, 35 (5), pp.923-26. ⟨10.1016/j.optmat.2012.11.008⟩. ⟨hal-00920057⟩