Deposition and dielectric characterization of strontium and tantalum-based oxide and oxynitride perovskite thin films

S. Jacq (1) , C. Le Paven (1) , L. Le Gendre (1) , Ratiba Benzerga (1) , François Cheviré (2) , Franck Tessier (2) , A. Sharaiha (1)

1 IETR - Institut d'Électronique et des Technologies du numéRique
2 ISCR - Institut des Sciences Chimiques de Rennes

Keywords: reactive sputtering; Thin films; Perovskite; Oxynitride; epitaxy; dielectric

Domains: Chemical Sciences

S. Jacq, C. Le Paven, L. Le Gendre, Ratiba Benzerga, François Cheviré, et al.. Deposition and dielectric characterization of strontium and tantalum-based oxide and oxynitride perovskite thin films. Solid State Sciences, 2016, 54, pp.22-29. ⟨10.1016/j.solidstatesciences.2015.12.010⟩. ⟨hal-01254806⟩