Elaboration, Characterizations, and Energetics of Robust Mo6 Cluster-Terminated Silicon-Bound Molecular Junctions
Abstract
Reaction of a [Mo6Br8F6]2- octahedral cluster unit with functional carboxylic acid leads to the formation of the corresponding carboxylate along with the elimination of HF and the formation of a Mo-O bond between the cluster and the carboxylate. This offers an easy way to prep. Mo6 cluster functionalized surfaces by simple reaction of carboxylic acid-modified n-type Si(111) surfaces in a soln. of [Mo6Br8F6]2- cluster units. The surface coverage of metallic clusters has been controlled in the range 0.3-5.8 × 1013 cm-2 by diln. of the carboxylic acid-terminated org. chains with inert n-dodecyl chains. The homogeneity of the grafted films on the oxide-free Si surface was followed by combined XPS and STM analyses whereas the electronic gap corresponding to the difference between the conduction band min. (CBM) and the valence band max. (VBM) of a single immobilized cluster was detd. from tunneling spectroscopy data obtained from a surface with a low cluster coverage. The energy position of the VBM of the functional surface was detd. by UPS for a surface with a high cluster coverage and charge transport characteristics through Hg//[Mo6Br8F6]-terminated org. monolayer (OML)//n-Si junctions were measured using the mercury drop technique. These studies allow the detn. of the electronic band diagram at the cluster-org. layer-Si(111) interfaces. Results are discussed and compared with other covalent assemblies of metallic clusters onto Si surfaces differing by the nature of cluster cores, [Re6Sei8]2+ or [Mo6Ii8]4+, and linker functionality, carboxylic acid or pyridine.