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Journal articles
Titanium vanadium nitride electrode for micro-supercapacitors
Abstract : Here we report on the synthesis of binary transition metal nitride electrodes based on titanium vanadium nitride (TiVN) thin films. These films were deposited by a method compatible with micro-electronic processes which consists of DC co-sputtering of vanadium (V) and titanium (Ti) targets. TiVN films with different Ti/V ratio were deposited. A dependence of the capacitance and the cycling stability with the Ti/V atomic ratio in the films was established. While V rich sample exhibits a Faradic behavior that limits its cycling ability despite a high areal and volumetric capacity, the addition of Ti in the film drastically improves the cycling ability with virtually no fade in capacitance after 10,000 cycles. Furthermore, a 1.1 Ti/V ratio leads to an areal capacitance up to 15 mF·cm− 2 in 1 M KOH electrolyte solution. Such electrodes shed light on the use of binary transition metal nitrides as candidate electrodes for micro-supercapacitor.
Keywords :
Titanium nitride
Volumetric capacity
Vanadium nitrides
Transition metal nitrides
Micro supercapacitors
Atomic ratio
Transition metals
Electrolyte solutions
Cosputtering
Cycling stability
Bins
Capacitance
Electrodes
Electrolytes
Nitrides
Refractory metal compounds
Supercapacitor
Thin films
Titanium
https://hal-univ-rennes1.archives-ouvertes.fr/hal-01484528
Contributor : Laurent Jonchère Connect in order to contact the contributor
Submitted on : Tuesday, July 4, 2017 - 2:37:55 PM
Last modification on : Friday, December 3, 2021 - 11:42:27 AM
Long-term archiving on: : Friday, December 15, 2017 - 12:02:44 AM
Contributor : Laurent Jonchère Connect in order to contact the contributor
Submitted on : Tuesday, July 4, 2017 - 2:37:55 PM
Last modification on : Friday, December 3, 2021 - 11:42:27 AM
Long-term archiving on: : Friday, December 15, 2017 - 12:02:44 AM
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Achour et al. - Titanium vanad...
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