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Titanium vanadium nitride electrode for micro-supercapacitors

Abstract : Here we report on the synthesis of binary transition metal nitride electrodes based on titanium vanadium nitride (TiVN) thin films. These films were deposited by a method compatible with micro-electronic processes which consists of DC co-sputtering of vanadium (V) and titanium (Ti) targets. TiVN films with different Ti/V ratio were deposited. A dependence of the capacitance and the cycling stability with the Ti/V atomic ratio in the films was established. While V rich sample exhibits a Faradic behavior that limits its cycling ability despite a high areal and volumetric capacity, the addition of Ti in the film drastically improves the cycling ability with virtually no fade in capacitance after 10,000 cycles. Furthermore, a 1.1 Ti/V ratio leads to an areal capacitance up to 15 mF·cm− 2 in 1 M KOH electrolyte solution. Such electrodes shed light on the use of binary transition metal nitrides as candidate electrodes for micro-supercapacitor.
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Submitted on : Tuesday, July 4, 2017 - 2:37:55 PM
Last modification on : Friday, December 3, 2021 - 11:42:27 AM
Long-term archiving on: : Friday, December 15, 2017 - 12:02:44 AM


Achour et al. - Titanium vanad...
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A. Achour, R. Lucio-Porto, M. Chaker, A. Arman, A. Ahmadpourian, et al.. Titanium vanadium nitride electrode for micro-supercapacitors. Electrochemistry Communications, Elsevier, 2017, 77, pp.40-43. ⟨10.1016/j.elecom.2017.02.011⟩. ⟨hal-01484528⟩



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