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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl-2/CH4 Plasma Chemistry

Abstract : We investigated the crystal lattice deformation that can occur during the etching of structures in bulk InP using SiNx hard masks with Ar/Cl-2/CH4 chemistries in an inductively coupled plasma reactor. Two techniques were used degree of polarization (DOP) of the photo-luminescence, which gives information on the state of mechanical stress present in the structures, and spectrally resolved cathodo-luminescence (CL) mapping. This second technique also provides elements on the mechanical stress in the samples through analysis of the spectral shift of the CL intrinsic emission lines. Preliminary DOP mapping experiments have been conducted on the SiNx hard mask patterns without etching the underlying InP. This preliminary study demonstrated the potential of DOP to map mechanical stress quantitatively in the structures. In a second step, InP patterns with various widths between 1 mu m and 20 mu m, and various depths between 1 mu m and 6 mu m, were analyzed by the 2 techniques. DOP measurements were made both on the (100) top surface of the samples and on the (110) cleaved cross section. CL measurements were made only from the (100) surface. We observed that inside the etched features, close to the vertical etched walls, there is always some compressive deformation, while it is tensile just outside the etched features. The magnitude of these effects depends on the lateral and depth dimensions of the etched structures, and on the separation between them (the tensile deformation increases between them due to some kind of proximity effect when separation decreases).
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Submitted on : Monday, September 10, 2018 - 11:13:28 AM
Last modification on : Friday, August 5, 2022 - 2:54:52 PM
Long-term archiving on: : Tuesday, December 11, 2018 - 1:32:05 PM


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Jean-Pierre Landesman, Daniel T Cassidy, Marc Fouchier, Erwine Pargon, Christophe Levallois, et al.. Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl-2/CH4 Plasma Chemistry. Journal of Electronic Materials, Institute of Electrical and Electronics Engineers, 2018, Special Section: 17th Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII), 47 (9), pp.4964-4969. ⟨10.1007/s11664-018-6152-6⟩. ⟨hal-01861357⟩



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