Fabrication of Devices and Antennas for Millimeter-Wave and Terahertz Systems

C. Lee 1 D. Gonzalez-Ovejero 2 M. Alonso-Delpino 1 T. Reck 1 A. Peralta 1 I. Mehdi 1 G. Chattopadhyay 1
1 JPL - Jet Propulsion Laboratory
2 IETR - Institut d'Electronique et de Télécommunications de Rennes
Abstract : We have demonstrated corrugated horn antennas at 340 GHz and 560 GHz fabricated with deep reactive ion etching (DRIE) process on silicon. The measurement of a single 340 GHz antenna showed that the return loss and gain are approximately 25 dB and 21 dBi, respectively. The measurement of two of the 2x2 560 GHz array antenna showed that the return loss and directivity are 13 dB and 22 dB, respectively. All of the measured antennas had below -25 dB of the cross-polarization and symmetrical beam patterns. The silicon microfabrication technique allows fabrication of hundreds of horn antennas at once, allowing construction of multi-pixel heterodyne imagers and spectrometers at submillimeter wavelengths. © 2018 KIEES.
Keywords : Corrugated Antenna Deep silicon etching Heterodyne Silicon Platelets Submillimeter wave
Document type :
Conference papers
Complete list of metadatas
https://hal-univ-rennes1.archives-ouvertes.fr/hal-02089117
Contributor : Laurent Jonchère <>
Submitted on : Wednesday, April 3, 2019 - 2:42:12 PM
Last modification on : Thursday, April 25, 2019 - 2:53:37 PM

Identifiers

  • HAL Id : hal-02089117, version 1

Collections

UNIV-RENNES1 | IETR | UR1-UFR-ISTIC | UNIV-NANTES | UNIV-RENNES | INSA-GROUPE

Citation

C. Lee, D. Gonzalez-Ovejero, M. Alonso-Delpino, T. Reck, A. Peralta, et al.. Fabrication of Devices and Antennas for Millimeter-Wave and Terahertz Systems. 2018 International Symposium on Antennas and Propagation, ISAP 2018, Oct 2018, Busan, South Korea. pp.8627725. ⟨hal-02089117⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

35