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Tunable TTB strontium and tantalum based thin films: Influence of the deposition parameters on the structural and dielectric properties

Abstract : Structural and dielectric properties of thin films produced by reactive radiofrequency sputtering of a (Sr2Ta2O7)100-x (La2Ti2O7)x target with x = 1.65 were studied. The chemical composition characterization shows Sr/Ta ratios ranging between 0.49 and 0.56, thus pointing out the deposition of strontium deficient films, belonging to the tetragonal tungsten bronze family. The highest permittivities and tunabilities, associated with the lowest dielectric losses, are obtained when films are pure and fully textured. This is achieved for a 900 nm-thick film deposited at TS = 850 °C: ε’ = 116, tanδ = 0.007 and tunability T = 14.5% at 340 kV/cm and 100 kHz.
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https://hal-univ-rennes1.archives-ouvertes.fr/hal-03355109
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Submitted on : Thursday, September 30, 2021 - 10:35:02 AM
Last modification on : Monday, January 24, 2022 - 12:16:34 PM
Long-term archiving on: : Friday, December 31, 2021 - 6:27:03 PM

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Mohamad Haydoura, Florent Marlec, Claire Le Paven, Ratiba Benzerga, Laurent Le Gendre, et al.. Tunable TTB strontium and tantalum based thin films: Influence of the deposition parameters on the structural and dielectric properties. Solid State Sciences, Elsevier, 2021, 121, pp.106733. ⟨10.1016/j.solidstatesciences.2021.106733⟩. ⟨hal-03355109⟩

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