Tunable TTB strontium and tantalum based thin films: Influence of the deposition parameters on the structural and dielectric properties - Archive ouverte HAL Access content directly
Journal Articles Solid State Sciences Year : 2021

Tunable TTB strontium and tantalum based thin films: Influence of the deposition parameters on the structural and dielectric properties

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Abstract

Structural and dielectric properties of thin films produced by reactive radiofrequency sputtering of a (Sr2Ta2O7)100-x (La2Ti2O7)x target with x = 1.65 were studied. The chemical composition characterization shows Sr/Ta ratios ranging between 0.49 and 0.56, thus pointing out the deposition of strontium deficient films, belonging to the tetragonal tungsten bronze family. The highest permittivities and tunabilities, associated with the lowest dielectric losses, are obtained when films are pure and fully textured. This is achieved for a 900 nm-thick film deposited at TS = 850 °C: ε’ = 116, tanδ = 0.007 and tunability T = 14.5% at 340 kV/cm and 100 kHz.
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Dates and versions

hal-03355109 , version 1 (30-09-2021)

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Mohamad Haydoura, Florent Marlec, Claire Le Paven, Ratiba Benzerga, Laurent Le Gendre, et al.. Tunable TTB strontium and tantalum based thin films: Influence of the deposition parameters on the structural and dielectric properties. Solid State Sciences, 2021, 121, pp.106733. ⟨10.1016/j.solidstatesciences.2021.106733⟩. ⟨hal-03355109⟩
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