Loading...
Derniers dépôts
-
Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
-
Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
-
Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
-
Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
-
Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
-
J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
-
T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
-
Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
-
Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
Rechercher
Nombre de documents
77
Nombre de notices
276
Mots-clés
A Thin films
Spectroscopic ellipsometry
Ablation laser
Physical vapor deposition
Sputtering
Chalcogenide glass
Mott insulators
X-ray photoelectron spectroscopy
Bixbyite
Thin films
CHLORINE PLASMAS
Buffer Couple
B1 Inorganic compounds
Resistive switching
Magnetron sputtering
B2 Quaternary
Carbon nanotubes
Biofilms microbiens
B2 Semiconducting indium compounds
Chalcogenide
CNTs’ collapse
Functionalization
Nanotubes
Nanocomposite
Atomic layer etching
CaTiO3Pr^3^+
CIGSe
Structure
Transfert d'énergie
Bipolar resistive switching BRS
Calcined clay
Capacitance
A Chalcogenides
Semiconductors
AuCu alloy
A3 Physical vapor deposition processes
Transmission electron microscopy
AlN
Etching
Biomasse
Plasma etching
B Chemical synthesis
Colloidal solution
Copper
A Multilayers
Oxides
Kirkendall effect
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Vanadium Sesquioxide
Low-pressure plasma processing
A1 Characterization
Amorphous
AZO thin films
Chalcogenides
Aluminium nitride
3 nm in size
Selenization
Carbon Nanotube
NEXAFS
XPS
Alzheimer's disease
BOMBARDMENT
B2 Semiconducting alloys
Optical properties
Non-volatile memory
Alloying
TEM
Biocapteurs
Ambipolar material
Anatase
A-CNx
Adsorption
Avalanche breakdown
SF 6
Carbon
Amyloid precursor
Titanium dioxide
Mott insulator
Films
Chemical detection
Plasmas froids
PECVD
Sol-gel
Band gap
Residual stress
Cathepsin
Thin film
Applications industrielles
CH4
C Photoelectron spectroscopy
V2O3
Atomic force microscopy
Band alignment
Aryl-diazonium salts
Scanning electron microscopy
B3 Solar cells
X-ray diffraction
TiO2
Carbon nitride
Chemical and biological sensors