Study of the Post-nitridation of Strontium and Tantalum Based Oxide and Oxynitride Thin Films - Archive ouverte HAL Access content directly
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Study of the Post-nitridation of Strontium and Tantalum Based Oxide and Oxynitride Thin Films

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hal-01588050 , version 1 (15-09-2017)

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  • HAL Id : hal-01588050 , version 1

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Florent Marlec, Laurent Le Gendre, Claire Le Paven, François Cheviré, Ratiba Benzerga, et al.. Study of the Post-nitridation of Strontium and Tantalum Based Oxide and Oxynitride Thin Films. 9th International Symposium on Nitrides and Related Materials (ISNT2017), Aug 2017, Sapporo, Japan. ⟨hal-01588050⟩
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