Influence of deposition parameters on the structure and microstructure of Bi12TiO20 films obtained by pulsed laser deposition

Abstract : The structure, morphology and surface roughness of Bi 12 TiO 20 (BTO) thin films grown on R-sapphire by pulsed laser deposition (PLD) were studied at different substrate temperatures, target-substrate distances, oxygen pressures and laser-pulse repetition rates. Although the substrate temperature seems to be the most important experimental parameter, the gas pressure and the target-substrate distance played important role on the phase formed and film thickness, with a significant effect of the laser-pulse repetition rate on the films thickness and preferred orientation of the deposited film. Single-phase γ-Bi 12 TiO 20 was obtained on substrates at 650 o C, while several BTO metastable phases were observed in films deposited on substrates at temperatures between 500 and 600 o C. By the first time, thin films of pure and textured δ-Bi 12 TiO 20 were successfully growth on substrates at 450 o C. When annealed, all the films deposited at lower temperatures resulted in the thermodynamically stable γ-Bi 12 TiO 20. 2 Keywords Bi 12 TiO 20 (BTO) thin films, pulsed laser deposition, metastable phases, metastable phases, morphology and surface roughness
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L.F. Gorup, V. Bouquet, S. Députier, V. Dorcet, M. Guilloux-Viry, et al.. Influence of deposition parameters on the structure and microstructure of Bi12TiO20 films obtained by pulsed laser deposition. Ceramics International, Elsevier, 2018, 45 (3), pp.3510-3517. ⟨10.1016/j.ceramint.2018.11.008⟩. ⟨hal-01954021⟩

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